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[真空紫外波段Al+MgF₂薄膜的偏振特性]

[Polarization characteristic of Al + MgF2 film at VUV].

作者信息

Liu Ying, Li Zhi-gang, Li Fu-tian

机构信息

State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022, China.

出版信息

Guang Pu Xue Yu Guang Pu Fen Xi. 2002 Oct;22(5):724-7.

Abstract

Polarization characteristic of Al + MgF2 is researched theoretically and experimentally. According to the theory of electromagnetism, the reflectance perpendicular and parallel to the incident plane of Al + MgF2 is calculated in the way of matrix optics. The effect of incident conditions and thickness of MgF2 is considered on the reflectance of Al + MgF2 coatings. The MgF2 not only prevents the oxidation of aluminum but also increases the reflectance of Al + MgF2 by interference. The polarization of Al + MgF2 is analyzed using the concept of ratio of extinction based on above mentioned calculations. The polarization character of Al + MgF2 and single Al coating is compared. The reflectances perpendicular and parallel to the incident plane of Al + MgF2 film are measured at VUV range, using LiF polarizer as a VUV polarizer. So the polarization character of Al + MgF2 is researched experimentally. Both theoretical and experimental results of the polarization character of Al + MgF2 are coincident.

摘要

对Al + MgF₂的偏振特性进行了理论和实验研究。根据电磁学理论,采用矩阵光学方法计算了Al + MgF₂垂直和平行于入射面的反射率。考虑了入射条件和MgF₂厚度对Al + MgF₂涂层反射率的影响。MgF₂不仅能防止铝的氧化,还能通过干涉提高Al + MgF₂的反射率。基于上述计算,利用消光比的概念分析了Al + MgF₂的偏振特性。比较了Al + MgF₂和单层Al涂层的偏振特性。使用LiF偏振器作为真空紫外偏振器,在真空紫外波段测量了Al + MgF₂薄膜垂直和平行于入射面的反射率。从而对Al + MgF₂的偏振特性进行了实验研究。Al + MgF₂偏振特性的理论和实验结果是一致的。

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