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双层面钻骨孔,适配于钻骨孔环及帽,用于刺激电极植入。技术说明。

Dual-floor burr hole adjusted to burr-hole ring and cap for implantation of stimulation electrodes. Technical note.

作者信息

Yamamoto Takamitsu, Katayama Yoichi, Kobayashi Kazutaka, Oshima Hideki, Fukaya Chikashi

机构信息

Department of Neurological Surgery, Nihon University School of Medicine, Tokyo, Japan.

出版信息

J Neurosurg. 2003 Oct;99(4):783-4. doi: 10.3171/jns.2003.99.4.0783.

DOI:10.3171/jns.2003.99.4.0783
PMID:14567618
Abstract

Using a new perforator, the authors have developed a new dual-floor burr-hole method for use in deep brain stimulation therapy. The modification is called "dual-floor" because the usual 15-mm-diameter burr hole, which is located centrally and reaches the dura mater, is surrounded by a 4-mm-wide rim that is also planed downward by the new perforator to a depth of 4 mm. This dual-floor burr hole is adjusted to fit the burr-hole ring and cap that are are supplied by the electrode manufacturer. Such a method eliminates bulging of the scalp just over the burr-hole ring and cap. In addition, it is helpful for securing a tight fixation between the burr-hole ring and the skull.

摘要

作者使用一种新型穿孔器,开发出一种用于深部脑刺激疗法的新型双层骨孔方法。这种改良被称为“双层”,是因为通常位于中央且直达硬脑膜的直径15毫米的骨孔,被一个4毫米宽的边缘环绕,该边缘也由新型穿孔器向下刨削至4毫米深度。这种双层骨孔经过调整,以适配电极制造商提供的骨孔环和帽。这种方法消除了骨孔环和帽正上方头皮的隆起。此外,它有助于确保骨孔环与颅骨之间的紧密固定。

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Dual-floor Burr Hole Technique Optimized for Modern Burr Hole Caps with an Internal Electrode Locking Mechanism.双层颅骨钻孔技术优化用于现代颅骨钻孔器,其具有内部电极锁定机构。
Neurol Med Chir (Tokyo). 2023 Sep 15;63(9):432-435. doi: 10.2176/jns-nmc.2023-0047. Epub 2023 Jul 10.
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Surgical management of adverse events associated with deep brain stimulation: A single-center experience.
与脑深部电刺激相关不良事件的外科治疗:单中心经验
SAGE Open Med. 2020 Mar 19;8:2050312120913458. doi: 10.1177/2050312120913458. eCollection 2020.