Che Shunai, Garcia-Bennett Alfonso E, Yokoi Toshiyuki, Sakamoto Kazutami, Kunieda Hironobu, Terasaki Osamu, Tatsumi Takashi
Division of Materials Science and Chemical Engineering, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Yokohama 240-8501, Japan.
Nat Mater. 2003 Dec;2(12):801-5. doi: 10.1038/nmat1022. Epub 2003 Nov 23.
Anionic surfactants are used in greater volume than any other surfactants because of their highly potent detergency and low cost of manufacture. However, they have not been used as templates for synthesizing mesoporous silica. Here we show a templating route for preparing mesoporous silicas based on self-assembly of anionic surfactants and inorganic precursors. We use aminosilane or quaternized aminosilane as co-structure-directing agent (CSDA), which is different from previous pathways. The alkoxysilane site of CSDA is co-condensed with inorganic precursors; the ammonium site of CSDA, attached to silicon atoms incorporated into the wall, electrostatically interacts with the anionic surfactants to produce well-ordered anionic-surfactant-templated mesoporous silicas (AMS). These have new structures with periodic modulations as well as two-dimensional hexagonal and lamellar phases. The periodic modulations may be caused by the coexistence of micelles that differ in size or curvature, possibly owing to local chirality. These mesoporous silicas provide a new family of mesoporous materials as well as shedding light on the structural behaviour of anionic surfactants.
由于具有高效的去污能力和较低的制造成本，阴离子表面活性剂的使用量比其他任何表面活性剂都要大。然而，它们尚未被用作合成介孔二氧化硅的模板。在此，我们展示了一种基于阴离子表面活性剂和无机前驱体自组装制备介孔二氧化硅的模板法。我们使用氨基硅烷或季铵化氨基硅烷作为共结构导向剂（CSDA），这与之前的方法不同。CSDA的烷氧基硅烷位点与无机前驱体共缩合；CSDA的铵位点连接到并入壁中的硅原子上，与阴离子表面活性剂发生静电相互作用，从而生成有序排列的阴离子表面活性剂模板介孔二氧化硅（AMS）。这些介孔二氧化硅具有新的结构，包括周期性调制以及二维六方相和层状相。周期性调制可能是由尺寸或曲率不同的胶束共存引起的，这可能是由于局部手性所致。这些介孔二氧化硅提供了一类新的介孔材料，同时也揭示了阴离子表面活性剂的结构行为。
