Huang Her Hsiung
Institute of Dental Materials, Chung Shan Medical University, 402, Taichung, Taiwan.
Biochem Biophys Res Commun. 2004 Feb 13;314(3):787-92. doi: 10.1016/j.bbrc.2003.12.173.
The biocompatibility of metal implants is related to their surface electrochemical characterizations. The in situ growing process of osteoblast-like U-2 OS cells on polished Ti and Ti-6Al-4V alloy during 72h incubation was monitored using the electrochemical impedance spectroscopy (EIS) measurement technique. The results showed that the presence of cells on metals led to an increase in the impedance and polarization resistance (R(p)) of metals. The impedance and R(p) increased as the cells grew (i.e., from adhesion, spreading to proliferation period). A trace amount of V element released from Ti-6Al-4V alloy led to a lower R(p) with respect to Ti metal during cell culture. In this study, a satisfactory equivalent circuit simulating the electrochemical characterizations of Ti and Ti-6Al-4V alloy cultured with cells was proposed. The EIS measurement technique was applied successfully to monitor the in situ growing process of U-2 OS cells on Ti and Ti-6Al-4V alloy.
金属植入物的生物相容性与其表面电化学特性有关。采用电化学阻抗谱(EIS)测量技术监测了成骨样U-2 OS细胞在抛光钛及Ti-6Al-4V合金上72小时培养过程中的原位生长过程。结果表明,金属表面细胞的存在导致金属的阻抗和极化电阻(R(p))增加。随着细胞生长(即从黏附、铺展到增殖期),阻抗和R(p)增加。在细胞培养过程中,Ti-6Al-4V合金释放的微量V元素导致其相对于钛金属的R(p)较低。本研究提出了一个令人满意的等效电路来模拟细胞培养的钛及Ti-6Al-4V合金的电化学特性。EIS测量技术成功应用于监测U-2 OS细胞在钛及Ti-6Al-4V合金上的原位生长过程。