Roth C B, Dutcher J R
Department of Physics and the Guelph-Waterloo Physics Institute, University of Guelph, Guelph, Ontario, Canada.
Eur Phys J E Soft Matter. 2003 Nov;12 Suppl 1:S103-7. doi: 10.1140/epjed/e2003-01-024-2. Epub 2003 Nov 5.
We have used ellipsometry to measure the glass transition temperature T(g) of high molecular weight (M(w)=790 x 10(3)), freely-standing films of atactic poly(methyl methacrylate) (a-PMMA), as well as films of the same polymer supported on two different substrates: the native oxide layer of silicon (Si) and gold-covered Si. We observe linear reductions in T(g) with decreasing film thickness h for the freely-standing PMMA films with 30 nm < h<100 nm, which is qualitatively similar to previous results obtained for freely-standing polystyrene (PS) films. However the magnitude of the T(g) reductions for PMMA is much less than for freely-standing films of PS of comparable molecular weight and thickness. We also find that for films supported on either substrate, with thicknesses as small as 30 nm, the T(g) values do not deviate substantially from the value measured for thick films.
我们使用椭偏仪测量了无规聚甲基丙烯酸甲酯(a-PMMA)的高分子量(M(w)=790×10³)自支撑薄膜以及支撑在两种不同基底上的相同聚合物薄膜的玻璃化转变温度T(g):硅(Si)的原生氧化层和金覆盖的Si。对于30nm<h<100nm的自支撑PMMA薄膜,我们观察到T(g)随薄膜厚度h减小呈线性降低,这在定性上与先前对自支撑聚苯乙烯(PS)薄膜得到的结果相似。然而,PMMA的T(g)降低幅度远小于分子量和厚度相当的自支撑PS薄膜。我们还发现,对于支撑在任一基底上、厚度小至30nm的薄膜,其T(g)值与厚膜测量值相比并无显著偏差。