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表面电荷对羟基磷灰石成核的影响。

The effect of surface charge on hydroxyapatite nucleation.

作者信息

Zhu Peixin, Masuda Yoshitake, Koumoto Kunihito

机构信息

Applied chemistry, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Nagoya, Aichi 464-8603 Japan.

出版信息

Biomaterials. 2004 Aug;25(17):3915-21. doi: 10.1016/j.biomaterials.2003.10.022.

Abstract

Both the charged surfaces and condition of supersaturated solutions are thought to be the important factors that greatly affect the nucleation of hydroxyapatite (HAp) onto the substrates. In the present study self-assembled monolayers (SAM) terminated with amino (NH2-SAM) and hydroxyl (OH-SAM) headgroups were employed to generate the positively and negatively charged surfaces, respectively. The soaking experiments for HAp nucleation were carried out in the supersaturated solutions (1.5 SBF) with Ca2+ and PO4(3-) ions concentrations 1.5 times higher than in simulated body fluid (SBF). The stability of solutions deeply depends on pH values if other factors (temperature, ionic series and their concentration, etc.) are fixed. Consequently, the opposite micropatterns of HAp films were observed on the UV-patterned SAM with NH2 and OH terminals in a stable solution (1.5 SBF, pH=7.2) where no particles formed and in an unstable solution (1.5 SBF, pH=7.6) where homogeneous nucleation occurred. The preferential nucleation of HAp was found on negative surface (OH-SAM) in a stable supersaturated solution, while selective deposition of HAp was formed on positive surface (NH2-SAM) in the unstable solution. Considering the latter results, it is conceivable that the electrostatic adhesion of microparticles formed in the solution dominated the formation of HAp in the unstable solution.

摘要

带电表面和过饱和溶液的状态都被认为是极大影响羟基磷灰石(HAp)在基底上成核的重要因素。在本研究中,分别采用以氨基(NH2-SAM)和羟基(OH-SAM)端基终止的自组装单分子层(SAM)来产生带正电和负电的表面。在Ca2+和PO4(3-)离子浓度比模拟体液(SBF)高1.5倍的过饱和溶液(1.5 SBF)中进行HAp成核的浸泡实验。如果其他因素(温度、离子种类及其浓度等)固定,溶液的稳定性很大程度上取决于pH值。因此,在稳定溶液(1.5 SBF,pH = 7.2,无颗粒形成)和不稳定溶液(1.5 SBF,pH = 7.6,发生均相成核)中,在具有NH2和OH末端的紫外图案化SAM上观察到了相反的HAp膜微观图案。在稳定的过饱和溶液中,HAp优先在负表面(OH-SAM)上成核,而在不稳定溶液中,HAp在正表面(NH2-SAM)上形成选择性沉积。考虑到后者的结果,可以想象溶液中形成的微粒的静电粘附主导了不稳定溶液中HAp的形成。

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