Bolt H, Hemel V, Koch F, Nickel H
Institut für Werkstoffe der Energietechnik, Forschungszentrum Jülich, D-52425, Jülich, Germany.
Anal Bioanal Chem. 1996 Jun;355(3-4):247-9. doi: 10.1007/s0021663550247.
Space resolved optical emission spectroscopy has been applied to determine the distribution of excited species in dense plasmas which are used for the deposition of thin coatings. Typical electron densities and electron temperatures in the plasma facility PETRA ( Plasma Engineering and Technology Research Assembly) are in the range of n(e) = 10(12) cm(-3) and T(e) = 10 eV. During the deposition process material (Al) is evaporated from a vapour cell under controlled conditions. The vapour stream is guided into a dense plasma which is composed of inert gas, Ar or He, and hydrocarbon species produced from the dissociation of C(2)H(2). The evaporated Al-stream which travels with thermal velocity into a plasma of high electron density, is nearly completely ionized due to the short mean free path for electron impact ionization in the above mentioned parameter range. Optical emission spectroscopy has been applied to investigate the interaction processes between the vapour stream and the plasma as well as the transport of the ionized Al along the applied magnetic field. For the measurements space resolved optical emission spectroscopy with an in-situ translation mechanism of the optical fibre has been used to measure the local concentrations of excited Al neutrals and ions as well as the concentration of the background plasma species.
空间分辨光发射光谱已被用于确定用于薄涂层沉积的高密度等离子体中激发态物质的分布。等离子体设备PETRA（等离子体工程与技术研究装置）中的典型电子密度和电子温度范围为n(e)=10(12) cm(-3)和T(e)=10 eV。在沉积过程中，材料（铝）在受控条件下从蒸汽池中蒸发。蒸气流被导入由惰性气体氩或氦以及由C(2)H(2)解离产生的碳氢化合物组成的高密度等离子体中。以热速度进入高电子密度等离子体的蒸发铝流，由于在上述参数范围内电子碰撞电离的平均自由程很短，几乎完全被电离。光发射光谱已被用于研究蒸气流与等离子体之间的相互作用过程以及电离铝沿外加磁场的传输。为了进行测量，使用了具有光纤原位平移机制的空间分辨光发射光谱来测量激发态铝中性原子和离子的局部浓度以及背景等离子体物质的浓度。
