Schitter G, Stark R W, Stemmer A
Nanotechnology Group, Swiss Federal Institute of Technology, Tannenstrasse 3, ETH Zentrum CLA, CH-8092 Zurich, Switzerland.
Ultramicroscopy. 2004 Aug;100(3-4):253-7. doi: 10.1016/j.ultramic.2003.11.008.
The dynamic behavior of the piezoelectric tube scanner limits the imaging rate in atomic force microscopy (AFM). In order to compensate for the lateral dynamics of the scanning piezo a model based open-loop controller is implemented into a commercial AFM system. Additionally, our new control strategy employing a model-based two-degrees-of-freedom controller improves the performance in the vertical direction, which is important for high-speed topographical imaging. The combination of both controllers in lateral and vertical direction compensates the three-dimensional dynamics of the AFM system and reduces artifacts that are induced by the systems dynamic behavior at high scan rates. We demonstrate this improvement by comparing the performance of the model-based controlled AFM to the uncompensated and standard PI-controlled system when imaging pUC 18 plasmid DNA in air as well as in a liquid environment.
压电管扫描仪的动态行为限制了原子力显微镜(AFM)的成像速率。为了补偿扫描压电的横向动态特性,一种基于模型的开环控制器被应用于商用AFM系统中。此外,我们采用基于模型的二自由度控制器的新控制策略提高了垂直方向的性能,这对于高速形貌成像很重要。横向和垂直方向上两种控制器的结合补偿了AFM系统的三维动态特性,并减少了在高扫描速率下由系统动态行为引起的伪像。当在空气以及液体环境中对pUC 18质粒DNA进行成像时,我们通过比较基于模型控制的AFM与未补偿和标准PI控制的系统的性能来证明这种改进。