Podgornik Rudi, Parsegian V Adrian
Laboratory of Physical and Structural Biology, NICHD, Building 9, Room 1E116, National Institutes of Health, Bethesda, Maryland 20892-0924, USA.
J Chem Phys. 2004 Oct 15;121(15):7467-73. doi: 10.1063/1.1796234.
We formulate and evaluate the van der Waals part of the free energy due to a dielectric profile that varies continuously throughout the space between two interacting bodies. Not considering the work needed to create the inhomogeneous dielectric profile, focusing only on that part of the free energy affected by the inhomogeneity, we compare the ensuing interaction free energy with that of the original Lifshitz formulation with its step function changes at material boundaries and uniform dielectric medium. Rather than the monotonically varying attraction between like bodies given by the original formulation, the inhomogeneous continuous dielectric function leads to attractions as well as repulsions. The Lifshitz result emerges naturally in the limit of separations much larger than the thickness of the interfaces.
我们针对在两个相互作用物体之间的空间中连续变化的介电分布,推导并评估自由能的范德华部分。不考虑创建非均匀介电分布所需的功,仅关注受非均匀性影响的自由能部分,我们将由此产生的相互作用自由能与原始 Lifshitz 公式的自由能进行比较,后者在材料边界处具有阶跃函数变化且介质均匀。非均匀连续介电函数导致的不是原始公式给出的同类物体之间单调变化的吸引力,而是既有吸引力又有排斥力。在间距远大于界面厚度的极限情况下,Lifshitz 结果自然出现。