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在倏逝X射线束中近晶膜的增厚。

Thickening of a smectic membrane in an evanescent X-ray beam.

作者信息

de Jeu W H, Fera A, Ostrovskii B I

机构信息

FOM-Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands.

出版信息

Eur Phys J E Soft Matter. 2004 Sep;15(1):61-4. doi: 10.1140/epje/i2004-10034-0.

DOI:10.1140/epje/i2004-10034-0
PMID:15480917
Abstract

We report an unusual thickening of smectic membranes under the influence of X-ray irradiation below the critical angle. In the case of a four-layer film the thickness was found to grow at the footprint of the beam, reaching within minutes tens of layers. The effect is attributed to the localized energy dissipation of the evanescent wave. The "island" thus created is not connected to the meniscus and after the beam is switched off the film returns to its original state. A possible explanation is given in terms of a local disrupture of the tension of the smectic membrane.

摘要

我们报道了在低于临界角的X射线辐照影响下,近晶膜出现的异常增厚现象。对于四层薄膜的情况,发现其厚度在光束的作用区域内增加,几分钟内就达到了几十层。这种效应归因于倏逝波的局部能量耗散。由此产生的“岛”与弯月面不相连,在光束关闭后,薄膜会恢复到其原始状态。我们从近晶膜张力的局部破坏角度给出了一种可能的解释。

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引用本文的文献

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