Yam Chi Ming, Lopez-Romero Juan Manuel, Gu Jianhua, Cai Chengzhi
Department of Chemistry, & Center for Materials Chemistry, University of Houson, Houston, Texas 77204, USA.
Chem Commun (Camb). 2004 Nov 7(21):2510-1. doi: 10.1039/b401499e. Epub 2004 Sep 27.
Atomically flat, homogeneous, and protein-resistant monolayers can be readily prepared on H-Si(111) surfaces by photo-induced hydrosilylation of alpha-oligo(ethylene glycol)-omega-alkenes.
通过α-低聚(乙二醇)-ω-烯烃的光诱导硅氢化反应,可以在H-Si(111)表面轻松制备出原子级平整、均匀且抗蛋白质的单分子层。