Onuki Teppei, Tokizaki Takashi
Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan.
Scanning. 2004 Sep-Oct;26(5 Suppl 1):I33-7.
Using a local oxidation process with a probe tip of a scanning near-field optical microscope (SNOM), antimony oxide structures with a pattern width of several 100 nm were fabricated on antimony thin films. We also investigated the characteristics of the oxidation process using the transmission mode SNOM. Although slight topographic changes due to oxidation were observed by atomic force microscopy, an increase in transmission due to the phase change of the metal to transparent oxide was observed. The depth of the oxide embedded in the antimony film was estimated from the change of the transmission intensity without destroying the sample. This fabrication method is appropriate for making a prototype of future nano-optical devices and for trimming them in order to optimize their functions on demand.
利用扫描近场光学显微镜(SNOM)的探针尖端进行局部氧化过程,在锑薄膜上制备了图案宽度为几百纳米的氧化锑结构。我们还使用透射模式SNOM研究了氧化过程的特性。尽管通过原子力显微镜观察到由于氧化导致的轻微形貌变化,但由于金属向透明氧化物的相变而观察到透射率增加。从透射强度的变化估计了嵌入锑薄膜中的氧化物深度,而不会破坏样品。这种制造方法适用于制造未来纳米光学器件的原型,并对其进行微调以按需优化其功能。