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锗纳米线的化学表面钝化

Chemical surface passivation of Ge nanowires.

作者信息

Hanrath Tobias, Korgel Brian A

机构信息

Department of Chemical Engineering, Texas Materials Institute, Center for Nano- and Molecular Science and Technology, The University of Texas at Austin, Austin, TX 78712-1062, USA.

出版信息

J Am Chem Soc. 2004 Dec 1;126(47):15466-72. doi: 10.1021/ja0465808.

Abstract

Surface oxidation and chemical passivation of single-crystal Ge nanowires with diameters ranging between 7 and 25 nm were studied. The surface chemistry differs significantly from that of well-studied monolithic atomically smooth single-crystal substrates. High-resolution Ge 3d XPS measurements reveal that Ge nanowires with chemically untreated surfaces exhibit greater susceptibility to oxidation than monolithic Ge substrates. Multiple solution-phase routes to Ge nanowire surface passivation were studied, including sulfidation, hydride and chloride termination, and organic monolayer passivation. Etching in HCl results in chloride-terminated surfaces, whereas HF etching leads to hydride termination with limited stability. Exposure to aqueous ammonium sulfide solutions leads to a thick glassy germanium sulfide layer. Thermally initiated hydrogermylation reactions with alkenes produce chemically stable, covalently bonded organic monolayer coatings that enable ohmic electrical contacts to be made to the nanowires.

摘要

研究了直径在7至25纳米之间的单晶锗纳米线的表面氧化和化学钝化。其表面化学性质与经过充分研究的整体式原子级光滑单晶衬底有显著差异。高分辨率锗3d XPS测量表明,表面未经化学处理的锗纳米线比整体式锗衬底更容易氧化。研究了多种用于锗纳米线表面钝化的溶液相途径,包括硫化、氢化物和氯化物终止以及有机单层钝化。在盐酸中蚀刻会产生氯化物终止的表面,而氢氟酸蚀刻会导致稳定性有限的氢化物终止。暴露于硫化铵水溶液会形成一层厚厚的玻璃状硫化锗层。与烯烃进行热引发的氢锗化反应会产生化学稳定的、共价键合的有机单层涂层,从而能够与纳米线形成欧姆电接触。

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