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继发于脑深部植入的头痛。

Headache secondary to deep brain implantation.

作者信息

Veloso F, Kumar K, Toth C

机构信息

Department of Medicine, Division of Neurology, The Plains Health Center, University of Saskatchewan, Regina, Canada.

出版信息

Headache. 1998 Jul-Aug;38(7):507-15. doi: 10.1046/j.1526-4610.1998.3807507.x.

DOI:10.1046/j.1526-4610.1998.3807507.x
PMID:15613166
Abstract

This article examines the headaches that can develop with deep brain stimulation. We identified 15 (23.4%) of 64 patients who developed chronic headaches following implantation of deep brain stimulation electrodes for relief of chronic pain syndromes. Electrodes were implanted in the periaqueductal gray, sensory thalamus, and internal capsule. None of these 15 patients reported similar headaches prior to the implantation. Although 5 patients were intermittent headache sufferers prior to implantation, they reported post-implantation headaches to be completely different in nature. Our experience suggests that headache syndromes may arise due to disturbance of serotonergic neurotransmission within deep brain structures.

摘要

本文探讨了深部脑刺激可能引发的头痛。我们在64例因缓解慢性疼痛综合征而植入深部脑刺激电极的患者中,发现有15例(23.4%)出现了慢性头痛。电极植入了导水管周围灰质、感觉丘脑和内囊。这15例患者在植入前均未报告有类似头痛。虽然其中5例患者在植入前有间歇性头痛,但他们报告植入后的头痛在性质上完全不同。我们的经验表明,头痛综合征可能是由于深部脑结构中血清素能神经传递受到干扰所致。

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