使用镍注入硼掺杂金刚石薄膜电极对四环素进行电分析并应用于流动注射系统。

Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system.

作者信息

Treetepvijit Surudee, Chuanuwatanakul Suchada, Einaga Yasuaki, Sato Rika, Chailapakult Orawon

机构信息

Department of Chemistry, Faculty of Science, Chulalongkorn University, Patumwan, Bangkok 10330, Thailand.

出版信息

Anal Sci. 2005 May;21(5):531-5. doi: 10.2116/analsci.21.531.

DOI:10.2116/analsci.21.531

PMID:15913142

Abstract

The electrochemical analysis of tetracycline was investigated using nickel-implanted boron-doped diamond thin film electrode by cyclic voltammetry and amperometry with a flow injection system. Cyclic voltammetry was used to study the electrochemical oxidation of tetracycline. Comparison experiments were carried out using as-deposited boron-doped diamond thin film electrode (BDD). Nickel-implanted boron-doped diamond thin film electrode (Ni-DIA) provided well-resolved oxidation irreversible cyclic voltammograms. The current signals were higher than those obtained using the as-deposited BDD electrode. Results using nickel-implanted boron-doped diamond thin film electrode in flow injection system coupled with amperometric detection are presented. The optimum potential for tetracycline was 1.55 V versus Ag/AgCl. The linear range of 1.0 to 100 microM and the detection limit of 10 nM were obtained. In addition, the application for drug formulation was also investigated.

摘要

采用镍注入硼掺杂金刚石薄膜电极，通过循环伏安法和流动注射系统安培法对四环素进行了电化学分析。循环伏安法用于研究四环素的电化学氧化。使用沉积态硼掺杂金刚石薄膜电极（BDD）进行了对比实验。镍注入硼掺杂金刚石薄膜电极（Ni-DIA）提供了分辨率良好的氧化不可逆循环伏安图。电流信号高于使用沉积态BDD电极获得的信号。给出了在流动注射系统中使用镍注入硼掺杂金刚石薄膜电极并结合安培检测的结果。四环素的最佳电位相对于Ag/AgCl为1.55 V。获得了1.0至100 microM的线性范围和10 nM的检测限。此外，还研究了其在药物制剂中的应用。