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通过紫外线、芬顿和光芬顿工艺降解药物甲硝唑。

Degradation of the pharmaceutical metronidazole via UV, Fenton and photo-Fenton processes.

作者信息

Shemer Hilla, Kunukcu Yasemin Kaçar, Linden Karl G

机构信息

Department of Civil and Environmental Engineering, Duke University, Box 90287, Durham, NC 27708-0287, USA.

出版信息

Chemosphere. 2006 Apr;63(2):269-76. doi: 10.1016/j.chemosphere.2005.07.029. Epub 2005 Sep 9.

DOI:10.1016/j.chemosphere.2005.07.029
PMID:16154173
Abstract

Degradation rates and removal efficiencies of Metronidazole using UV, UV/H2O2, H2O2/Fe2+, and UV/H2O2/Fe2+ were studied in de-ionized water. The four different oxidation processes were compared for the removal kinetics of the antimicrobial pharmaceutical Metronidazole. It was found that the degradation of Metronidazole by UV and UV/H2O2 exhibited pseudo-first order reaction kinetics. By applying H2O2/Fe2+, and UV/H2O2/Fe2+ the degradation kinetics followed a second order behavior. The quantum yields for direct photolysis, measured at 254 nm and 200-400 nm, were 0.0033 and 0.0080 mol E(-1), respectively. Increasing the concentrations of hydrogen peroxide promoted the oxidation rate by UV/ H2O2. Adding more ferrous ions enhanced the oxidation rate for the H2O2/Fe2+ and UV/H2O2/Fe2+ processes. The major advantages and disadvantages of each process and the complexity of comparing the various advanced oxidation processes on an equal basis are discussed.

摘要

在去离子水中研究了使用紫外线(UV)、UV/H₂O₂、H₂O₂/Fe²⁺和UV/H₂O₂/Fe²⁺降解甲硝唑的速率及去除效率。比较了这四种不同氧化过程对抗菌药物甲硝唑的去除动力学。结果发现,UV和UV/H₂O₂降解甲硝唑呈现准一级反应动力学。应用H₂O₂/Fe²⁺和UV/H₂O₂/Fe²⁺时,降解动力学遵循二级反应行为。在254 nm和200 - 400 nm处测得的直接光解量子产率分别为0.0033和0.0080 mol E⁻¹。增加过氧化氢浓度可提高UV/H₂O₂的氧化速率。添加更多亚铁离子可提高H₂O₂/Fe²⁺和UV/H₂O₂/Fe²⁺过程的氧化速率。讨论了每个过程的主要优缺点以及在同等基础上比较各种高级氧化过程的复杂性。

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