Shin Yongwoo, Roberts James E, Santore Maria M
Department of Chemical Engineering, Lehigh University, Bethlehem, Pennsylvania 18015, USA.
J Colloid Interface Sci. 2002 Mar 1;247(1):220-30. doi: 10.1006/jcis.2001.8100.
This work examines polyelectrolyte adsorption (exclusively driven by electrostatic attractions) for a model system (DMAEMA, polydimethylaminoethyl methacrylate, adsorbing onto silica) where the adsorbing polycation is more densely charged than the substrate. Variations in the relative charge densities of the polymer and substrate are accomplished by pH, and the polycation is of sufficiently low molecular weight that the adsorbed conformation is generally flat under all conditions examined. We demonstrate, quantitatively, that the charge overcompensation observed on the isotherm plateau can be attributed to the denser positive charge on the adsorbing polycation and that the ultimate coverage obtained corresponds to the adsorption of one oligomer onto each original negative silica charge, when the silica charge is most sparse, at pH 6. This limiting behavior breaks down at higher pHs where the greater silica charge density accommodates single chains adsorbing onto multiple negative sites. As a result of the greater substrate charge density and reduced polycation charge at higher pHs, the extent of charge overcompensation diminishes while the coverage increases on the plateau of the isotherm. Ultimately at the highest pHs, a regime is approached where the coil's excluded surface area, not surface charge, limits the ultimate coverage. In addition to quantifying the crossover from the charge-limiting to the area-limiting behaviors, this paper quantitatively reports adsorption-induced changes in bound counterion density and ionization at the interface, which were generally found to be independent of coverage for this model system.
本研究考察了一个模型体系(聚甲基丙烯酸二甲氨基乙酯(DMAEMA)吸附到二氧化硅上)中的聚电解质吸附(完全由静电引力驱动),其中吸附的聚阳离子比底物带电荷更密集。聚合物和底物相对电荷密度的变化通过pH值实现,并且聚阳离子的分子量足够低,以至于在所有考察条件下吸附构象通常是扁平的。我们定量证明,在等温线平台上观察到的电荷过补偿可归因于吸附聚阳离子上更密集的正电荷,并且当二氧化硅电荷最稀疏时,在pH 6条件下,最终获得的覆盖率对应于每个原始负二氧化硅电荷吸附一个低聚物。这种极限行为在较高pH值下会失效,此时更大的二氧化硅电荷密度允许单链吸附到多个负位点上。由于在较高pH值下底物电荷密度增加且聚阳离子电荷减少,电荷过补偿程度减小,而等温线平台上的覆盖率增加。最终在最高pH值时,接近一种状态,即线圈的排除表面积而非表面电荷限制了最终覆盖率。除了定量描述从电荷限制行为到面积限制行为的转变外,本文还定量报告了吸附引起的界面处结合抗衡离子密度和电离的变化,对于该模型体系,这些变化通常被发现与覆盖率无关。