Gallais Laurent, Commandré Mireille
Institut Fresnel, Unité Mixte de Recherche, Ecole Généraliste d'Ingénieurs de Marseille--Aix Marselle I--Aix Marseille III, Domaine Universitaire de Saint Jerome, 13397, Marseille Cedex 20, France.
Appl Opt. 2006 Mar 1;45(7):1416-24. doi: 10.1364/ao.45.001416.
An experimental setup, based on the laser-induced deflection technique, is developed to measure simultaneously the 244 nm laser absorption, scattering, and luminescence on optical components. The different techniques and methods that have been specifically developed to obtain both high resolution (micronic) and sensitivity (a few 10(-7) of the incident power for the absorption, 10(-8) for scattering and fluorescence) are presented. Different applications are then explored: the study of losses in deep UV multilayer coatings (HfO2/SiO2 mirrors) and the analysis of contamination defects on bare substrate and structural defects in optical coatings.
基于激光诱导偏转技术开发了一种实验装置，用于同时测量光学元件上的244 nm激光吸收、散射和发光。介绍了为获得高分辨率（微米级）和灵敏度（吸收为入射功率的几10^(-7)，散射和荧光为10^(-8)）而专门开发的不同技术和方法。然后探索了不同的应用：深紫外多层膜（HfO2/SiO2镜）损耗的研究以及裸基板上污染缺陷和光学涂层结构缺陷的分析。
