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钆(Gd)L 边的 X 射线反射率。

X-ray reflectivity at the L edges of Gd.

作者信息

Ishimatsu N, Venkataraman C T, Hashizume H, Hosoito N, Namikawa K, Iwazumi T

机构信息

Materials and Structure Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori,Yokohama 266, Japan.

出版信息

J Synchrotron Radiat. 1997 May 1;4(Pt 3):175-9. doi: 10.1107/S0909049597001441.

DOI:10.1107/S0909049597001441
PMID:16699225
Abstract

Preparations are underway for the experimental investigation of the roughness of magnetic interfaces in rare-earth multilayers by combining the grazing-angle X-ray scattering technique with the resonant magnetic scattering of hard X-rays. Theoretical considerations show that for small scattering angles, 2theta, the asymmetry ratio, A = [I(+) - I(-)]/[I(+) + I(-)], depends on 2theta and varies as 1/cos theta. The first step towards the goal of determining the magnetic roughness has been taken by measuring the chemical roughness (via specular reflectivity) of a Gd thin-film sample at five photon energies close to the L(3) absorption edge, which yielded the dispersion corrections, f' and f'', to the Gd atomic form factor in good agreement with the calculation of Cromer & Liberman [J. Chem. Phys. (1970), 53, 1891-1898].

摘要

正在筹备通过将掠角X射线散射技术与硬X射线的共振磁散射相结合,对稀土多层膜中磁性界面的粗糙度进行实验研究。理论分析表明,对于小散射角2θ,不对称率A = [I(+) - I(-)]/[I(+) + I(-)]取决于2θ,且随1/cosθ变化。朝着确定磁粗糙度目标迈出的第一步是,在接近L(3)吸收边的五个光子能量下测量Gd薄膜样品的化学粗糙度(通过镜面反射率),由此得到的Gd原子形状因子的色散修正f'和f''与Cromer和Liberman的计算结果[《化学物理杂志》(1970年),53卷,1891 - 1898页]吻合良好。

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