Zhao Wei, Low Hong Yee, Suresh P S
Institute of Materials Research and Engineering, 3, Research Link, Singapore 117602.
Langmuir. 2006 Jun 6;22(12):5520-4. doi: 10.1021/la052523w.
A new format of polymer support having cross-linked polymeric micro- and nanoarrays has been fabricated via reactive reversal nanoimprint lithography. Reactive reversal nanoimprint lithography is a relatively simple method to imprint highly cross-linked and chemically tunable polymers. An array of chloromethyl-functionalized cross-linked polystyrene has been imprinted on hard (silicon) and soft (polymer) substrates, and a model esterification reaction is demonstrated. The imprints have been found to be relatively stable under both static and dynamic stability tests carried out in various organic solvents. The chemical functionality is evenly distributed over the imprinted array. This method of fabricating polymer supports offers a high degree of freedom in terms of the choice of chemical functionality, the types of polymer matrix, and the size of the polymer support. The functional polymer support has potential applications for chemical and biological assays.
通过反应性反转纳米压印光刻技术制备了一种具有交联聚合物微阵列和纳米阵列的新型聚合物载体。反应性反转纳米压印光刻技术是一种用于压印高度交联且化学性质可调聚合物的相对简单的方法。一系列氯甲基官能化的交联聚苯乙烯已被压印在硬质（硅）和软质（聚合物）基底上，并展示了一个模型酯化反应。在各种有机溶剂中进行的静态和动态稳定性测试表明，这些压印图案相对稳定。化学官能团均匀分布在压印阵列上。这种制备聚合物载体的方法在化学官能团的选择、聚合物基质的类型以及聚合物载体的尺寸方面提供了高度的自由度。这种功能性聚合物载体在化学和生物分析方面具有潜在应用。
