Huijben Mark, Rijnders Guus, Blank Dave H A, Bals Sara, Van Aert Sandra, Verbeeck Jo, Van Tendeloo Gustaaf, Brinkman Alexander, Hilgenkamp Hans
Faculty of Science & Technology and MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands.
Nat Mater. 2006 Jul;5(7):556-60. doi: 10.1038/nmat1675. Epub 2006 Jun 18.
Perovskite oxides exhibit a plethora of exceptional properties, providing the basis for novel concepts of oxide-electronic devices. The interest in these materials is even extended by the remarkable characteristics of their interfaces. Studies on single epitaxial connections between the wide-bandgap insulators LaAlO3 and SrTiO3 have revealed them to be either high-mobility electron conductors or insulating, depending on the atomic stacking sequences. For device applications, as well as for a basic understanding of the interface conduction mechanism, it is important to investigate the electronic coupling of closely spaced complementary interfaces. Here we report the successful realization of such coupled interfaces in SrTiO3-LaAlO3 thin-film multilayer structures. We found a critical separation distance of six perovskite unit cell layers, corresponding to approximately 23 A, below which a decrease of the interface conductivity and carrier density occurs. Interestingly, the high carrier mobilities characterizing the separate conducting interfaces are found to be maintained in coupled structures down to subnanometre interface spacing.
钙钛矿氧化物展现出众多优异特性,为氧化物电子器件的新颖概念奠定了基础。对这些材料的兴趣甚至因它们界面的显著特性而进一步扩展。对宽带隙绝缘体LaAlO3和SrTiO3之间的单个外延连接的研究表明,根据原子堆叠顺序,它们要么是高迁移率电子导体,要么是绝缘体。对于器件应用以及对界面传导机制的基本理解而言,研究紧密间隔的互补界面的电子耦合非常重要。在此,我们报告了在SrTiO3-LaAlO3薄膜多层结构中成功实现此类耦合界面。我们发现临界分离距离为六个钙钛矿晶胞层,约对应23埃,低于此距离,界面电导率和载流子密度会降低。有趣的是,在耦合结构中,直至亚纳米级界面间距,表征单独导电界面的高载流子迁移率仍得以保持。