Nakamura Ryuhei, Ohashi Naomichi, Imanishi Akihito, Osawa Takeo, Matsumoto Yuji, Koinuma Hideomi, Nakato Yoshihiro
J Phys Chem B. 2005 Feb 10;109(5):1648-51. doi: 10.1021/jp044710t.
Essentially atomically smooth (100) and (110) n-TiO(2) (rutile) surfaces were prepared by immersion of commercially available single-crystal wafers in 20% HF, followed by annealing at 600 degrees C in air. The obtained surfaces were stable in aqueous solutions of pH 1-13, showing no change in the surface morphology on an atomic level, contrary to atomically flat surfaces prepared by ion sputtering and annealing under UHV. The success in preparation of the atomically smooth and stable n-TiO(2) surfaces enabled us to reveal clear crystal-face dependences of the surface band edges and hole reactivity in aqueous solutions.
通过将市售的单晶晶片浸入20%的氢氟酸中，随后在空气中600℃退火，制备出了基本原子级光滑的(100)和(110) n型二氧化钛（金红石）表面。与在超高真空下通过离子溅射和退火制备的原子级平整表面相反，所获得的表面在pH值为1 - 13的水溶液中是稳定的，在原子水平上表面形态没有变化。成功制备出原子级光滑且稳定的n型二氧化钛表面，使我们能够揭示水溶液中表面能带边缘和空穴反应性的明显晶面依赖性。
