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在氮化镓缓冲层上外延生长的排列良好的氧化锌纳米线的拉曼散射和高效紫外光致发光。

Raman scattering and efficient UV photoluminescence from well-aligned ZnO nanowires epitaxially grown on GaN buffer layer.

作者信息

Cheng Hsin-Ming, Hsu Hsu-Cheng, Tseng Yung-Kuan, Lin Li-Jiaun, Hsieh Wen-Feng

机构信息

Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, 1001 Tahsueh Road, Hsinchu 30050, Taiwan.

出版信息

J Phys Chem B. 2005 May 12;109(18):8749-54. doi: 10.1021/jp0442908.

DOI:10.1021/jp0442908
PMID:16852037
Abstract

Optical phonon confinement and efficient UV emission of ZnO nanowires were investigated in use of resonant Raman scattering (RRS) and photoluminescence (PL). The high-quality ZnO nanowires with diameters of 80-100 nm and lengths of several micrometers were epitaxially grown through a simple low-pressure vapor-phase deposition method at temperature 550 degrees C on the precoated GaN(0001) buffer layer. The increasing intensity ratio of n-order longitudinal optical (LO) phonon (A(1)(nLO)/E(1)(nLO)) with increasing scattering order in RRS reveals the phonon quantum confinement as shrinking the diameter of ZnO nanowires. The exciton-related recombination near the band-edge transition dominate the UV emissions at room temperature as well as at low temperature that exhibits almost no other nonstoichiometric defects in the ZnO nanowires.

摘要

利用共振拉曼散射(RRS)和光致发光(PL)研究了ZnO纳米线的光学声子限制和高效紫外发射。通过简单的低压气相沉积法,在550℃下于预涂覆的GaN(0001)缓冲层上外延生长出直径为80 - 100nm、长度为几微米的高质量ZnO纳米线。RRS中n阶纵向光学(LO)声子的强度比(A(1)(nLO)/E(1)(nLO))随散射阶数增加而增大,这揭示了随着ZnO纳米线直径缩小的声子量子限制。在室温以及低温下,带边跃迁附近的激子相关复合主导了紫外发射,这表明ZnO纳米线中几乎不存在其他非化学计量缺陷。

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