Brevnov Dmitri A, Bungay Corey
Department of Chemical and Nuclear Engineering, Center for Micro-Engineered Materials, The University of New Mexico, Albuquerque, New Mexico 87131, USA.
J Phys Chem B. 2005 Aug 4;109(30):14529-35. doi: 10.1021/jp0511707.
Electrodeposition of gold mesoparticles on anodized and chemically etched aluminum/copper films deposited on silicon wafers proceeds by instantaneous nucleation and with no diffusion limitations. Both of these phenomena favor the formation of relatively monodispersed gold particles. Under the reported electrodeposition conditions, the relative standard deviation of the particle diameter is 25%. The particle coverage is 7 x 10(8) particles cm(-2). The mean particle diameter varies as a function of electrodeposition time in the range of 40-80 nm. Optical constants of gold mesoparticles are resolved by spectroscopic ellipsometry. A two-layer optical model is constructed to determine both extinction coefficients and refractive indexes of gold mesoparticles as a function of the mean particle diameter. The absorption peak, associated with surface plasmons, is modeled with two Lorentz oscillators. Absorption peak maximums shift from 610 to 675 nm as the mean particle diameter increases from 42 to 74 nm. Electrodeposition of gold particles on technologically relevant substrates, such as aluminum/copper films, is expected to increase the utility of gold particles and facilitate their incorporation in nanostructured materials and a variety of electronic and optical devices.
金介观粒子在沉积于硅片上的阳极氧化和化学蚀刻铝/铜薄膜上的电沉积过程通过瞬时成核进行,且不存在扩散限制。这两种现象都有利于形成相对单分散的金粒子。在所报道的电沉积条件下,粒径的相对标准偏差为25%。粒子覆盖率为7×10⁸个粒子·cm⁻²。平均粒径在40 - 80 nm范围内随电沉积时间而变化。金介观粒子的光学常数通过光谱椭偏仪测定。构建了一个双层光学模型,以确定金介观粒子的消光系数和折射率随平均粒径的变化。与表面等离子体相关的吸收峰用两个洛伦兹振荡器进行建模。随着平均粒径从42 nm增加到74 nm,吸收峰最大值从610 nm移至675 nm。预计在技术相关的衬底(如铝/铜薄膜)上电沉积金粒子将提高金粒子的实用性,并促进其融入纳米结构材料以及各种电子和光学器件中。