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蒸发镍纳米颗粒与高度取向热解石墨的相互作用:通过X射线光电子能谱研究的与表面缺陷的反馈键合。

Interaction of evaporated nickel nanoparticles with highly oriented pyrolytic graphite: Back-bonding to surface defects, as studied by X-ray photoelectron spectroscopy.

作者信息

Yang D-Q, Sacher E

机构信息

Regroupement Québécois de Matériaux de Pointe, Département de Génie Physique, Ecole Polytechnique, CP 6079, succursale Centre-Ville, Montréal, Québec H3C 3A7, Canada.

出版信息

J Phys Chem B. 2005 Oct 20;109(41):19329-34. doi: 10.1021/jp0536504.

Abstract

Ni nanoparticle evaporation onto highly oriented pyrolytic graphite (HOPG), with low and high surface defect densities, has been studied in situ by X-ray photoelectron spectroscopic (XPS) techniques, including binding energy shifts, Auger parameters, and Wagner plots. Ni nucleates at defect sites, whether initially present or those introduced by Ar+ bombardment, with the formation of spherical nanoparticles, which adhere strongly through Ni/HOPG back-bonding. The variation of the C 1s peak intensity with Ni coverage suggests that the photoelectron emission yield may be enhanced at lower Ni coverages, due to Ni nanoparticle-induced electron localization and work function reduction at the HOPG surface, which is evidence of such back-bonding.

摘要

通过X射线光电子能谱(XPS)技术,包括结合能位移、俄歇参数和瓦格纳图,对镍纳米颗粒在具有低和高表面缺陷密度的高度取向热解石墨(HOPG)上的蒸发进行了原位研究。镍在缺陷位点成核,无论是最初存在的缺陷位点还是由Ar+轰击引入的缺陷位点,都会形成球形纳米颗粒,这些纳米颗粒通过Ni/HOPG反向键合而强烈附着。C 1s峰强度随镍覆盖率的变化表明,由于镍纳米颗粒引起的电子局域化和HOPG表面功函数的降低,在较低的镍覆盖率下光电子发射产率可能会提高,这是这种反向键合的证据。

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