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核酸内切酶III在有DNA和无DNA情况下的直接电化学。

Direct electrochemistry of endonuclease III in the presence and absence of DNA.

作者信息

Gorodetsky Alon A, Boal Amie K, Barton Jacqueline K

机构信息

Department of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California 91125, USA.

出版信息

J Am Chem Soc. 2006 Sep 20;128(37):12082-3. doi: 10.1021/ja064784d.

Abstract

The electrochemistry of the base excision repair enzyme Endonuclease III (Endo III) in the presence and absence of DNA has been examined on highly oriented pyrolytic graphite (HOPG). At the surface modified with pyrenated DNA, a reversible signal is observed at 20 mV versus NHE for the [4Fe-4S]3+/2+ couple of Endo III, similar to Au. Without DNA modification, oxidative and reductive signals for the [4Fe-4S] cluster of Endo III are found on bare HOPG, allowing a direct comparison between DNA-bound and free redox potentials. These data indicate a shift of approximately -200 mV in the 3+/2+ couple upon binding of Endo III to DNA. This potential shift reflects a difference in affinity for DNA of more than 3 orders of magnitude between the oxidized 3+ and reduced 2+ protein and provides quantitative support for our model utilizing DNA-mediated charge transport to redistribute base excision repair enzymes in the vicinity of damaged DNA.

摘要

在有和没有DNA存在的情况下,已在高度取向热解石墨(HOPG)上研究了碱基切除修复酶核酸内切酶III(Endo III)的电化学性质。在芘修饰的DNA表面,观察到Endo III的[4Fe-4S]3+/2+电对相对于标准氢电极(NHE)在20 mV处有可逆信号,这与金表面的情况类似。在未修饰DNA的情况下,在裸露的HOPG上发现了Endo III的[4Fe-4S]簇的氧化和还原信号,从而可以直接比较与DNA结合和游离状态下的氧化还原电位。这些数据表明,Endo III与DNA结合时,其3+/2+电对的电位大约偏移了-200 mV。这种电位偏移反映了氧化态3+和还原态2+蛋白质对DNA的亲和力相差超过3个数量级,为我们利用DNA介导的电荷传输在受损DNA附近重新分布碱基切除修复酶的模型提供了定量支持。

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