Novel DNA nano-patterning design method utilizing poly-L-lysine patterning by nanoimprint lithography.

The DNA properties have been deliberated to comprehend new functional bio-devices. However there are few reports on DNA nano-patterning to make them. Therefore, we have tried DNA nano-patterning by using a nanoimprint process. A substrate coated with a poly-L-lysine was heated at 120 degrees C for 5 min in atmosphere, and nanoimprint carried out at 120 degrees C, 6 MPa, 5 min, and we applied 1 mg/ml DNA solution on the substrate and immobilized with the poly-L-lysine. Finally the substrate was washed at twice in water and at once in hot water intensely. DNA lines that consist of lines at about 700 nm as line width was obtain, and the very fine lines correspond to convex patterns of the mold surface. These results suggest that the imprint would make the poly-L-lysine reform by exposing it under high pressure and high temperature. Therefore since DNA is immobilized with the amino group in the poly-L-lysine, a lot of amino group would expose on the surface by the imprint from the balk, and would be patterned DNA.