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碳化硅纳米网上的C60

C60 on SiC nanomesh.

作者信息

Chen Wei, Zhang Hong Liang, Xu Hai, Tok Eng Soon, Loh Kian Ping, Wee Andrew Thye Shen

机构信息

Nanoscience and Nanotechnology Initiative, National University of Singapore, 2 Science Drive 3, 117542, Singapore.

出版信息

J Phys Chem B. 2006 Nov 2;110(43):21873-81. doi: 10.1021/jp0642241.

Abstract

A SiC nanomesh is used as a nanotemplate to direct the epitaxy of C60 molecules. The epitaxial growth of C60 molecules on SiC nanomesh at room temperature is investigated by in situ scanning tunneling microscopy, revealing a typical Stranski-Krastanov mode (i.e., for the first one or two monolayers, it is a layer-by-layer growth or 2-D nucleation mode; at higher thicknesses, it changes to island growth or a 3-D nucleation mode). At submonolayer (0.04 and 0.2 ML) coverage, C60 molecules tend to aggregate to form single-layer C60 islands that mainly decorate terrace edges, leaving the uncovered SiC nanomesh almost free of C60 molecules. At 1 ML C60 coverage, a complete wetting layer of hexagonally close-packed C60 molecules forms on top of the SiC nanomesh. At higher coverage from 4.5 ML onward, the C60 stacking adopts a (111) oriented face-centered-cubic (fcc) structure. Strong bright and dim molecular contrasts have been observed on the first layer of C60 molecules, which are proposed to originate from electronic effects in a single-layer C60 island or the different coupling of C60 molecules to SiC nanomesh. These STM molecular contrast patterns completely disappear on the second and all the subsequent C60 layers. It is also found that the nanomesh can be fully recovered by annealing the C60/SiC nanomesh sample at 200 degrees C for 20 min.

摘要

碳化硅纳米网被用作纳米模板来引导C60分子的外延生长。通过原位扫描隧道显微镜研究了C60分子在室温下于碳化硅纳米网上的外延生长,揭示了一种典型的斯特兰斯基-克拉斯坦诺夫模式(即,对于最初的一两个单层,它是逐层生长或二维成核模式;在更高的厚度下,它转变为岛状生长或三维成核模式)。在亚单层(0.04和0.2 ML)覆盖度下,C60分子倾向于聚集形成单层C60岛,这些岛主要装饰台阶边缘,使得未覆盖的碳化硅纳米网几乎没有C60分子。在1 ML C60覆盖度下,在碳化硅纳米网顶部形成了一层六方密堆积的C60分子的完整润湿层。在从4.5 ML起的更高覆盖度下,C60堆积采用(111)取向的面心立方(fcc)结构。在C60分子的第一层上观察到了强烈的亮暗分子对比度,这被认为源于单层C60岛中的电子效应或C60分子与碳化硅纳米网的不同耦合。这些STM分子对比度图案在C60的第二层及所有后续层上完全消失。还发现通过在200摄氏度下对C60/碳化硅纳米网样品退火20分钟,可以使纳米网完全恢复。

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