Huang Han, Chen Wei, Chen Shi, Wee Andrew Thye Shen
Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore.
ACS Nano. 2008 Dec 23;2(12):2513-8. doi: 10.1021/nn800711v.
We use in situ low temperature scanning tunneling microscopy (STM) to investigate the growth mechanism of epitaxial graphene (EG) thermally grown on Si-terminated 6H-SiC(0001). Our detailed study of the transition from monolayer EG to trilayer EG reveals that EG adopts a bottom-up growth mechanism. The thermal decomposition of one single SiC bilayer underneath the EG layers causes the accumulation of carbon atoms to form a new graphene buffer layer at the EG/SiC interface. Atomically resolved STM images show that the top EG layer is physically continuous across the boundaries between the monolayer and bilayer EG regions and between the bilayer and trilayer EG regions.
我们使用原位低温扫描隧道显微镜(STM)来研究在硅端接的6H-SiC(0001)上热生长的外延石墨烯(EG)的生长机制。我们对从单层EG到三层EG转变的详细研究表明,EG采用自下而上的生长机制。EG层下方单个SiC双层的热分解导致碳原子积累,在EG/SiC界面形成新的石墨烯缓冲层。原子分辨的STM图像显示,顶部EG层在单层和双层EG区域之间以及双层和三层EG区域之间的边界上是物理连续的。