Chuang Wei-Ching, Ho Chi-Ting, Chang Wen-Chung
Department of Electro-Optics Engineering, National Formosa University, Yulin, Taiwan.
Appl Opt. 2006 Nov 10;45(32):8304-7. doi: 10.1364/ao.45.008304.
We have developed a soft-lithography method to replicate polymer waveguides. In this method, the waveguides are produced by a two-step molding process where a master mold is first formed on a negative-tone photoresist and subsequently transferred to a polydimethylsiloxane (PDMS) mold; a PDMS silicone rubber mold is then used as a stamp to transfer the final waveguide pattern onto an UV cure epoxy. Initial results show good pattern transferring in physical shape. The optical performance is measured based on the propagation loss. In our design, the loss was measured at 0.28 dB/cm for 1.3 microm and 0.26 dB/cm for 1.55 microm.
我们开发了一种用于复制聚合物波导的软光刻方法。在该方法中,波导通过两步成型工艺制造,首先在负性光刻胶上形成母模,随后将其转移到聚二甲基硅氧烷(PDMS)模具上;然后使用PDMS硅橡胶模具作为压模,将最终的波导图案转移到紫外光固化环氧树脂上。初步结果表明,在物理形状上图案转移良好。基于传播损耗来测量光学性能。在我们的设计中,对于1.3微米波长,损耗测量为0.28分贝/厘米,对于1.55微米波长,损耗测量为0.26分贝/厘米。