Cambie Rossana, Downing Kenneth H, Typke Dieter, Glaeser Robert M, Jin Jian
Engineering Division, Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720, USA.
Ultramicroscopy. 2007 Apr-May;107(4-5):329-39. doi: 10.1016/j.ultramic.2006.09.001. Epub 2006 Oct 12.
A miniature electrostatic element has been designed to selectively apply a 90 degrees phase shift to the unscattered beam in the back focal plane of the objective lens, in order to realize Zernike-type, in-focus phase contrast in an electron microscope. The design involves a cylindrically shaped, biased-voltage electrode, which is surrounded by a concentric grounded electrode. Electrostatic calculations have been used to determine that the fringing fields in the region of the scattered electron beams will cause a negligible phase shift as long as the ratio of electrode length to the transverse feature size is greater than 5:1. Unlike the planar, three-electrode einzel lens originally proposed by Boersch for the same purpose, this new design does not require insulating layers to separate the biased and grounded electrodes, and it can thus be produced by a very simple microfabrication process. Scanning electron microscope images confirm that mechanically robust devices with feature sizes of approximately 1 microm can be easily fabricated. Preliminary experimental images demonstrate that these devices do apply a 90 degrees phase shift between the scattered and unscattered electrons, as expected.
为了在电子显微镜中实现泽尼克型的焦内相衬,设计了一种微型静电元件,用于在物镜后焦平面上对未散射光束选择性地施加90度相移。该设计包括一个圆柱形的偏置电压电极,其周围环绕着一个同心接地电极。通过静电计算确定,只要电极长度与横向特征尺寸之比大于5:1,散射电子束区域的边缘场引起的相移就可以忽略不计。与最初由博尔施提出用于相同目的的平面三电极单透镜不同,这种新设计不需要绝缘层来分隔偏置电极和接地电极,因此可以通过非常简单的微加工工艺制造。扫描电子显微镜图像证实,可以轻松制造出特征尺寸约为1微米的机械坚固的器件。初步实验图像表明,这些器件确实如预期的那样在散射电子和未散射电子之间施加了90度相移。