Ezoe Yuichiro, Koshiishi Masaki, Mita Makoto, Mitsuda Kazuhisa, Hoshino Akio, Ishisaki Yoshitaka, Yang Zhen, Takano Takayuki, Maeda Ryutaro
Department of High Energy Astrophysics, Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency, 3-1-1 Yoshinodai, Sagamihara, Kanagawa 229-8510, Japan.
Appl Opt. 2006 Dec 10;45(35):8932-8. doi: 10.1364/ao.45.008932.
To develop x-ray mirrors for micropore optics, smooth silicon (111) sidewalls obtained after anisotropic wet etching of a silicon (110) wafer were studied. A sample device with 19 microm wide (111) sidewalls was fabricated using a 220 microm thick silicon (110) wafer and potassium hydroxide solution. For what we believe to be the first time, x-ray reflection on the (111) sidewalls was detected in the angular response measurement. Compared to ray-tracing simulations, the surface roughness of the sidewalls was estimated to be 3-5 nm, which is consistent with the atomic force microscope and the surface profiler measurements.
为了开发用于微孔光学的X射线反射镜，对在硅（110）晶片进行各向异性湿法蚀刻后获得的光滑硅（111）侧壁进行了研究。使用一块220微米厚的硅（110）晶片和氢氧化钾溶液制造了一个具有19微米宽（111）侧壁的样品装置。在角度响应测量中，我们首次检测到了（111）侧壁上的X射线反射。与光线追踪模拟相比，侧壁的表面粗糙度估计为3 - 5纳米，这与原子力显微镜和表面轮廓仪的测量结果一致。
