Xiu Yonghao, Zhu Lingbo, Hess Dennis W, Wong C P
School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 311 Ferst Drive, Atlanta, Georgia 30332-0100, USA.
Nano Lett. 2007 Nov;7(11):3388-93. doi: 10.1021/nl0717457. Epub 2007 Oct 11.
Silicon surface hydrophobicity has been varied by using silane treatments on silicon pyramid surfaces generated by KOH anisotropic etching. Results demonstrated that by altering the surface hydrophobicity, the apparent contact angle changed in accord with the Wenzel equation for surface structures with inclined side walls. Hierarchical structures were also constructed from Si pyramids where nanostructures were added by Au-assisted electroless HF/H2O2 etching. Surface hydrophobicity and superhydrophobicity were achieved by surface modification with a variety of silanes. Stability of the Cassie state of superhydrophobicity is described with respect to the Laplace pressure as indicated by the water droplet meniscus in contact with the hierarchical structures. The contact angle hysteresis observed is also discussed with respect to water/substrate adhesion.
通过在KOH各向异性蚀刻产生的硅金字塔表面上进行硅烷处理,改变了硅表面的疏水性。结果表明,通过改变表面疏水性,表观接触角根据具有倾斜侧壁的表面结构的文泽尔方程而变化。还从硅金字塔构建了分级结构,其中通过金辅助化学镀HF/H2O2蚀刻添加了纳米结构。通过用各种硅烷进行表面改性实现了表面疏水性和超疏水性。根据与分级结构接触的水滴弯月面所指示的拉普拉斯压力,描述了超疏水性的卡西态稳定性。还讨论了观察到的接触角滞后与水/基底附着力的关系。