Yang Jee-Eun, Jin Chang-Beom, Kim Cheol-Joo, Jo Moon-Ho
Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), San 31, Hyoja-Dong, Nam-Gu, Pohang, Gyungbuk, Korea 790-784.
Nano Lett. 2006 Dec;6(12):2679-84. doi: 10.1021/nl0614821.
We report the energy band-gap modulation of single-crystalline Si1-xGex (0 <or= x <or= 1) nanowires ranging from near-infrared (NIR) to visible regions by optical band-edge absorption. Single-crystalline Si1-xGex nanowires were grown by an Au catalyst-assisted chemical vapor synthesis using SiH4 and GeH4 precursors, and the relative composition of Si and Ge was reproducibly directed in the whole range of 0 <or= x <or= 1 by controlling the kinetics of catalytic decomposition of precursors near the eutectic temperature with Au. We show that, by the appropriate alloying of Si and Ge to form random solid solutions at the nanometer scale, the energy band-gap of Si1-xGex is tuned from 0.68 to 2.25 eV. Specifically, we demonstrate that with respect to the fundamental energy band-gap of bulk Si, the optical-absorption band edge shifts to a lower energy with increasing Ge content, and also that the band edge shifts to a higher energy with decreasing diameter of the nanowires below certain sizes. Our finding demonstrates that the energy band-gap of Si1-xGex nanowires can be modulated in a wider energy range and suggests implications for group-IV semiconductor nanowire photonics.
我们报道了通过光带边吸收实现的从近红外(NIR)到可见光区域的单晶Si1-xGex(0≤x≤1)纳米线的能带隙调制。使用SiH4和GeH4前驱体通过金催化剂辅助化学气相合成法生长单晶Si1-xGex纳米线,并且通过控制前驱体在共晶温度附近与金的催化分解动力学,可在0≤x≤1的整个范围内可重复地控制Si和Ge的相对组成。我们表明,通过在纳米尺度上适当合金化Si和Ge以形成随机固溶体,Si1-xGex的能带隙可从0.68 eV调谐至2.25 eV。具体而言,我们证明,相对于块状Si的基本能带隙,随着Ge含量的增加,光吸收带边向较低能量移动,并且当纳米线直径减小到特定尺寸以下时,带边也向较高能量移动。我们的发现表明,Si1-xGex纳米线的能带隙可以在更宽的能量范围内进行调制,并对IV族半导体纳米线光子学具有启示意义。