Yarger Matthew S, Steinmiller Ellen M P, Choi Kyoung-Shin
Department of Chemistry, Purdue University, West Lafayette, IN 47907, USA.
Chem Commun (Camb). 2007 Jan 14(2):159-61. doi: 10.1039/b609621b. Epub 2006 Oct 26.
An electrochemical synthetic condition is developed to produce cobalt hydroxide films with significantly increased basal spacings (d(001)>or= 25.0 A) by incorporating anionic surfactants (i.e. sodium dodecyl sulfate and 1-hexadecanesulfonate) into the interlayer regions via electrodeposition.
通过电沉积将阴离子表面活性剂（即十二烷基硫酸钠和十六烷磺酸盐）引入层间区域，开发了一种电化学合成条件，以制备具有显著增加的基面间距（d(001)≥25.0 Å）的氢氧化钴薄膜。
