Ohkubo C, Kurihara D, Shimpo H, Suzuki Y, Kokubo Y, Hosoi T
Department of Removable Prosthodontics, Tsurumi University School of Dental Medicine, Yokohama, Japan.
J Oral Rehabil. 2007 Jan;34(1):52-6. doi: 10.1111/j.1365-2842.2006.01641.x.
The implants in implant-supported removable partial dentures (RPDs) are placed in the edentulous ridge to stabilize the RPD and minimize the resultant rotational movement. This study investigated the effect of implant placement on RPD stability. A model simulating a mandibular bilateral distal extension missing was fabricated using epoxy resin and silicone impression material as thin (1 mm) and thick (2 mm) soft tissues. Five pressure sensors (PS-10K, Kyowa, Tokyo, Japan) were attached near the left and right first molars (#36 and #46), first premolars (#34 and #44) and medio-lingual alveolar crest. Five bilateral distal extension RPDs with Co-Cr frameworks were conventionally fabricated. After the implants were placed at the bilateral second molar areas, healing caps (4.5 mm high) were connected to the denture base with autopolymerized resin to support the RPD. As in a conventional RPD, sealing screws were placed without connecting them. Loads up to 5 kg were applied, and the pressure and displacement of the RPDs (n = 5) were simultaneously measured and analysed using the Wilcoxen test (alpha = 0.05). There was less pressure on both thin and thick soft tissues, the #36, #46 and the medio-lingual alveolar crest from the implant-supported RPD than from the conventional RPD (P < 0.05). There were no significant differences in pressure on #34 and #44 between the two RPDs (P > 0.05). There was significantly less denture displacement of the implant-supported RPD than of the conventional denture (P < 0.05). Implant support helped prevent the displacement of distal extension RPDs and decreased the pressure on soft tissues.
种植体支持的可摘局部义齿(RPD)中的种植体被植入无牙颌牙槽嵴,以稳定RPD并使由此产生的旋转运动最小化。本研究调查了种植体植入对RPD稳定性的影响。使用环氧树脂和硅橡胶印模材料制作了模拟下颌双侧远中游离缺失的模型,分别模拟薄(1mm)和厚(2mm)软组织。在左右第一磨牙(#36和#46)、第一前磨牙(#34和#44)以及舌侧牙槽嵴中部附近连接了五个压力传感器(PS-10K,日本东京共和电业株式会社)。常规制作了五个带有钴铬支架的双侧远中游离RPD。在双侧第二磨牙区域植入种植体后,用自凝树脂将愈合帽(4.5mm高)连接到义齿基托上以支持RPD。与传统RPD一样,放置封闭螺钉但不进行连接。施加高达5kg的载荷,使用Wilcoxon检验(α = 0.05)同时测量并分析RPD(n = 5)的压力和位移。与传统RPD相比,种植体支持的RPD在薄和厚软组织、#36、#46以及舌侧牙槽嵴中部产生的压力更小(P < 0.05)。两种RPD在#34和#44处的压力无显著差异(P > 0.05)。种植体支持的RPD的义齿位移明显小于传统义齿(P < 0.05)。种植体支持有助于防止远中游离RPD的位移并降低软组织上的压力。