Colakerol Leyla, Veal T D, Jeong Hae-Kyung, Plucinski Lukasz, DeMasi Alex, Learmonth Timothy, Glans Per-Anders, Wang Shancai, Zhang Yufeng, Piper L F J, Jefferson P H, Fedorov Alexei, Chen Tai-Chou, Moustakas T D, McConville C F, Smith Kevin E
Department of Physics, Boston University, Boston, Massachusetts 02215, USA.
Phys Rev Lett. 2006 Dec 8;97(23):237601. doi: 10.1103/PhysRevLett.97.237601. Epub 2006 Dec 4.
Electron accumulation states in InN have been measured using high resolution angle-resolved photoemission spectroscopy (ARPES). The electrons in the accumulation layer have been discovered to reside in quantum well states. ARPES was also used to measure the Fermi surface of these quantum well states, as well as their constant binding energy contours below the Fermi level E(F). The energy of the Fermi level and the size of the Fermi surface for these quantum well states could be controlled by varying the method of surface preparation. This is the first unambiguous observation that electrons in the InN accumulation layer are quantized and the first time the Fermi surface associated with such states has been measured.
利用高分辨率角分辨光电子能谱(ARPES)测量了InN中的电子积累态。已发现积累层中的电子处于量子阱态。ARPES还用于测量这些量子阱态的费米面,以及它们在费米能级E(F)以下的恒定结合能轮廓。通过改变表面制备方法,可以控制这些量子阱态的费米能级能量和费米表面大小。这是首次明确观察到InN积累层中的电子是量子化的,也是首次测量到与这些态相关的费米面。