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Polarizing beam splitter of a deep-etched fused-silica grating.

作者信息

Wang Bo, Zhou Changhe, Wang Shunquan, Feng Jijun

机构信息

Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, Shanghai, China.

出版信息

Opt Lett. 2007 May 15;32(10):1299-301. doi: 10.1364/ol.32.001299.

DOI:10.1364/ol.32.001299
PMID:17440567
Abstract

We described a highly efficient polarizing beam splitter (PBS) of a deep-etched binary-phase fused-silica grating, where TE- and TM-polarized waves are mainly diffracted in the -1st and 0th orders, respectively. To achieve a high extinction ratio and diffraction efficiency, the grating depth and period are optimized by using rigorous coupled-wave analysis, which can be well explained based on the modal method with effective indices of the modes for TE/TM polarization. Holographic recording technology and inductively coupled plasma etching are employed to fabricate the fused-silica PBS grating. Experimental results of diffraction efficiencies approaching 80% for a TE-polarized wave in the -1st order and more than 85% for a TM-polarized wave in the 0th order were obtained at a wavelength of 1550 nm. Because of its compact structure and simple fabrication process, which is suitable for mass reproduction, a deep-etched fused-silica grating as a PBS should be a useful device for practical applications.

摘要

相似文献

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Polarizing beam splitter of a deep-etched fused-silica grating.
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