Feng Jijun, Zhou Changhe, Wang Bo, Zheng Jiangjun, Jia Wei, Cao Hongchao, Lv Peng
Information Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, Shanghai, China.
Appl Opt. 2008 Dec 10;47(35):6638-43. doi: 10.1364/ao.47.006638.
A deep-etched polarization-independent binary fused-silica phase grating as a three-port beam splitter is designed and manufactured. The grating profile is optimized by use of the rigorous coupled-wave analysis around the 785 nm wavelength. The physical explanation of the grating is illustrated by the modal method. Simple analytical expressions of the diffraction efficiencies and modal guidelines for the three-port beam splitter grating design are given. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results are in good agreement with the theoretical values.
