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半金属异质结构的密度泛函理论研究:硅中的间隙锰

Density-functional theory study of half-metallic heterostructures: interstitial Mn in Si.

作者信息

Wu Hua, Kratzer Peter, Scheffler Matthias

机构信息

Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin, Germany.

出版信息

Phys Rev Lett. 2007 Mar 16;98(11):117202. doi: 10.1103/PhysRevLett.98.117202. Epub 2007 Mar 12.

Abstract

Using density-functional theory within the generalized gradient approximation, we show that Si-based heterostructures with 1/4 layer delta doping of interstitial Mn (Mn(int)) are half-metallic. For Mn(int) concentrations of 1/2 or 1 layer, the states induced in the band gap of delta-doped heterostructures still display high spin polarization, about 85% and 60%, respectively. The proposed heterostructures are more stable than previously assumed delta layers of substitutional Mn. Contrary to widespread belief, the present study demonstrates that interstitial Mn can be utilized to tune the magnetic properties of Si, and thus provides a new clue for Si-based spintronics materials.

摘要

利用广义梯度近似下的密度泛函理论,我们表明具有1/4层间隙锰(Mn(int))δ掺杂的硅基异质结构是半金属性的。对于1/2或1层的Mn(int)浓度,δ掺杂异质结构带隙中诱导的态仍显示出高自旋极化率,分别约为85%和60%。所提出的异质结构比先前假设的替代锰δ层更稳定。与普遍看法相反,本研究表明间隙锰可用于调节硅的磁性能,从而为硅基自旋电子学材料提供了新线索。

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