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用于液晶器件取向层的分子尺度软压印光刻技术。

Molecular-scale soft imprint lithography for alignment layers in liquid crystal devices.

作者信息

Lin Rongsheng, Rogers John A

机构信息

Department of Materials Science and Engineering, Beckman Institute, Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA.

出版信息

Nano Lett. 2007 Jun;7(6):1613-21. doi: 10.1021/nl070559y. Epub 2007 May 23.

DOI:10.1021/nl070559y
PMID:17518505
Abstract

We describe molecular-scale soft nanoimprint lithographic replication of rubbed polyimide substrates to form alignment layers for liquid crystal devices. Systematic studies of the surface relief morphology of the polyimide and molded structures in three different polymers illustrate good lithographic fidelity down to relief heights of several nanometers, and with some capabilities at the level of approximately 1 nm. Collective results of experiments with several polymer formulations for molds and molded materials and process conditions indicate that this molecular-scale fidelity in replication can be used to produce surfaces that will effectively align liquid crystal molecules. Good electro-optical responses from liquid crystal light modulators that are formed in this manner suggest utility for fundamental studies and potential practical application.

摘要

我们描述了对摩擦过的聚酰亚胺基板进行分子尺度的软纳米压印光刻复制,以形成用于液晶器件的取向层。对聚酰亚胺和三种不同聚合物中模制结构的表面起伏形态进行的系统研究表明,在起伏高度低至几纳米时具有良好的光刻保真度,并且在约1纳米的水平上具有一定能力。对几种用于模具、模制材料和工艺条件的聚合物配方进行实验的综合结果表明,这种复制中的分子尺度保真度可用于制造能够有效排列液晶分子的表面。以这种方式形成的液晶光调制器具有良好的电光响应,这表明其在基础研究和潜在实际应用方面具有实用性。

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