Jegadesan Subbiah, Sindhu Swaminathan, Valiyaveettil Suresh
Department of Chemistry, 3 Science Drive 3, National University of Singapore, Singapore.
J Nanosci Nanotechnol. 2007 Jun;7(6):2172-5. doi: 10.1166/jnn.2007.789.
SPM based lithographic techniques have been developed to pattern various substrates such as metals, semiconductors, and organic/polymer films due to its simplicity and high spatial precision nanostructure. Fabrication of nanostructure using polymeric materials is a key technique for the development of nanodevices. Here, we report the fabrication of nanostructures from polyacrylicacid (PAA) and polymethacrylicacid (PMAA) film on a silicon substrate using atomic force microscope (AFM). The formation of the nanopattern from the polymer film was studied using electrostatic nanolithography and the optimization of the conditions for nanopatterning of the polymer film was investigated with respect to the applied potential and translational speed of the AFM tip. The nanostructure of size 28 nm was created using the biased AFM tip on the PMAA film coated on Si(100) substrate and found that this method is a direct and reliable method to produce uniform nanostructures on a polymer film.
基于扫描探针显微镜（SPM）的光刻技术因其简单性和高空间精度的纳米结构，已被用于对各种衬底进行图案化，如金属、半导体以及有机/聚合物薄膜。使用聚合物材料制造纳米结构是纳米器件开发的一项关键技术。在此，我们报告了使用原子力显微镜（AFM）在硅衬底上由聚丙烯酸（PAA）和聚甲基丙烯酸（PMAA）薄膜制造纳米结构的过程。利用静电纳米光刻技术研究了聚合物薄膜中纳米图案的形成，并针对AFM针尖的施加电势和平移速度，研究了聚合物薄膜纳米图案化条件的优化。在涂覆于Si(100)衬底上的PMAA薄膜上，使用带偏压的AFM针尖创建了尺寸为28 nm的纳米结构，并且发现该方法是在聚合物薄膜上制备均匀纳米结构的一种直接且可靠的方法。
