Tcheremiskine V I, Uteza O P, Sentis M L, Mikheev L D
Laboratoire Lasers, Plasmas et Procédés Photoniques (LP3), UMR 6182 CNRS-Université Aix-Marseille II, Campus de Luminy, Case 917, 13288 Marseille Cedex 9, France.
Rev Sci Instrum. 2007 Jun;78(6):063103. doi: 10.1063/1.2744225.
Absolute measurements of the vacuum-ultraviolet (VUV) radiation power produced by a planar broadband optical source of submicrosecond light pulse duration are carried out in the transient regime of formation of a photodissociation (bleaching) wave in a photodecomposing absorptive medium. The source is based on a multichannel surface discharge initiated in ArN(2) gas mixtures on the area of approximately 0.1 m(2). The energetic characteristics of the produced VUV radiation are determined on the basis of spatially and temporally resolved observations of the pulsed photolysis of XeF(2) vapors. It is shown that the photon flux intensity produced by the source within the spectral range of 120-200 nm reaches 1.1 x 10(23) photonscm(2) s corresponding to the effective brightness temperature of discharge plasma of 20 kK and to the intrinsic efficiency of the discharge VUV emission of 3.2%. Numerical simulations of the photolysis process show a rather weak sensitivity of the results to the fraction of discharge radiation emitted into the line spectrum, as well as to the angular distribution of emitted radiation. The spectral band of measurements can be selected according to the choice of parent photodecomposing particles.
在光分解吸收介质中光解离（漂白）波形成的瞬态过程中，对亚微秒光脉冲持续时间的平面宽带光源产生的真空紫外（VUV）辐射功率进行了绝对测量。该光源基于在面积约为0.1 m²的Ar - N₂气体混合物中引发的多通道表面放电。所产生的VUV辐射的能量特性是基于对XeF₂蒸气脉冲光解的空间和时间分辨观测确定的。结果表明，该光源在120 - 200 nm光谱范围内产生的光子通量强度达到1.1×10²³光子/(cm²·s)，对应于放电等离子体的有效亮度温度为20 kK，放电VUV发射的固有效率为3.2%。光解过程的数值模拟表明，结果对发射到线光谱中的放电辐射分数以及发射辐射的角分布的敏感性相当弱。测量的光谱带可以根据母体光分解粒子的选择来确定。
