Yake Allison M, Snyder Charles E, Velegol Darrell
Department of Chemical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA.
Langmuir. 2007 Aug 14;23(17):9069-75. doi: 10.1021/la7011292. Epub 2007 Jul 13.
Individual colloidal particles are locally functionalized with nanoscale control. Here we use the particle lithography technique to mask one region of a silica or polystyrene particle (size 3.0 mum down to 170 nm), while the remaining 95% or more of the particle is coated with various sized nanocolloids. The images and data show precise and predictable control over the size of the region, with fine-tuned patch size control obtainable by changing the ionic strength of the solution. The coating on the particles remains stable even when subjected to sonication for 5 min. Both single regions and multilayer annuluses are readily formed. Particle lithography provides a general, reliable, stable, controllable, and scalable method for placing site-specific functionalizations on individual particles, opening the way to more complex particle patterning and the bottom-up assembly of more complex structures.
单个胶体颗粒通过纳米级控制进行局部功能化。在这里，我们使用粒子光刻技术对二氧化硅或聚苯乙烯颗粒（尺寸从3.0微米到170纳米）的一个区域进行掩膜，而颗粒其余95%或更多的部分则涂覆有各种尺寸的纳米胶体。图像和数据显示了对该区域尺寸的精确且可预测的控制，通过改变溶液的离子强度可实现对补丁尺寸的微调控制。即使经过5分钟的超声处理，颗粒上的涂层仍保持稳定。单区域和多层环都很容易形成。粒子光刻为在单个颗粒上进行位点特异性功能化提供了一种通用、可靠、稳定、可控且可扩展的方法，为更复杂的颗粒图案化以及更复杂结构的自下而上组装开辟了道路。
