Mukherjee Rabibrata, Gonuguntla Manoj, Sharma Ashutosh
Department of Chemical Engineering, Indian Institute of Technology, Kanpur 208016, India.
J Nanosci Nanotechnol. 2007 Jun;7(6):2069-75. doi: 10.1166/jnn.2007.771.
Controlled dewetting of thin polymer films on physically heterogeneous substrates is employed as a new soft lithography route to obtain various types of ordered meso-scale structures, including nano-membranes and ordered arrays of nano-droplets. Dewetting of a thin polymer film on a defect free homogeneous surface occurs by a randomly placed collection of holes and droplets with a well-defined spacing. In contrast, on a physically patterned surface, strong influence of the underlying pattern is observed on the dewetting pathways as well as on the ordering and size of the resulting meso-scale structures. The imposed periodicity of the substrate pattern vis-à-vis the spinodal length scale of dewetting provides a powerful tool for the morphology and size control. The thickness of the film and the kinetics of dewetting are the other important parameters that govern the morphology of the resulting structures.
将聚合物薄膜在物理性质不均匀的基底上进行可控去湿,作为一种新的软光刻方法,用于获得各种类型的有序中尺度结构,包括纳米膜和纳米液滴的有序阵列。在无缺陷的均匀表面上,聚合物薄膜的去湿是通过随机分布的具有明确间距的孔洞和液滴来实现的。相比之下,在物理图案化的表面上,观察到基底图案对去湿路径以及所得中尺度结构的有序性和尺寸有强烈影响。相对于去湿的旋节线长度尺度,基底图案所施加的周期性为形态和尺寸控制提供了一个强大的工具。薄膜的厚度和去湿动力学是控制所得结构形态的其他重要参数。