Division of Superconductivity and Magnetism, University of Leipzig, Leipzig, Germany.
Nanotechnology. 2012 Mar 2;23(8):085302. doi: 10.1088/0957-4484/23/8/085302. Epub 2012 Feb 1.
This paper presents a method to obtain submicron- and nanometer structures of different oxide films and heterostructures combining e-beam lithography and chemical etching. The most relevant advantage of this method is that structures of tens of microns in length and below ∼100 nm width can be produced, keeping the intrinsic bulk film properties, as proven by electrical transport measurements. In this way our method provides a bridge that connects the attractive properties of oxide films and the nanoworld.
本文提出了一种结合电子束光刻和化学刻蚀来获得不同氧化物薄膜和异质结构的亚微米和纳米结构的方法。该方法最显著的优点是可以制备长度达数十微米、宽度小于∼100nm 的结构，同时保持了体薄膜的固有特性，这一点可以通过电输运测量得到证实。通过这种方式，我们的方法为氧化物薄膜和纳米世界的诱人特性之间搭建了一座桥梁。
