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外延石墨烯的表面转移p型掺杂

Surface transfer p-type doping of epitaxial graphene.

作者信息

Chen Wei, Chen Shi, Qi Dong Chen, Gao Xing Yu, Wee Andrew Thye Shen

机构信息

Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542, Singapore.

出版信息

J Am Chem Soc. 2007 Aug 29;129(34):10418-22. doi: 10.1021/ja071658g. Epub 2007 Aug 1.

Abstract

Epitaxial graphene thermally grown on 6H-SiC(0001) can be p-type doped via a novel surface transfer doping scheme by modifying the surface with the electron acceptor, tetrafluoro-tetracyanoquinodimethane (F4-TCNQ). Synchrotron-based high-resolution photoemission spectroscopy reveals that electron transfer from graphene to adsorbed F4-TCNQ is responsible for the p-type doping of graphene. This novel surface transfer doping scheme by surface modification with appropriate molecular acceptors represents a simple and effective method to nondestructively dope epitaxial graphene for future nanoelectronics applications.

摘要

在6H-SiC(0001)上热生长的外延石墨烯可以通过一种新型的表面转移掺杂方案进行p型掺杂,该方案是用电子受体四氟四氰基对苯二醌二甲烷(F4-TCNQ)对表面进行改性。基于同步加速器的高分辨率光电子能谱表明,从石墨烯到吸附的F4-TCNQ的电子转移是石墨烯p型掺杂的原因。这种通过用合适的分子受体进行表面改性的新型表面转移掺杂方案,代表了一种简单有效的方法,可用于无损掺杂外延石墨烯,以用于未来的纳米电子应用。

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