Stöger-Pollach M, Laister A, Schattschneider P
University Service Center for Transmission Electron Microscopy, Technische Universität Wien, Wien, Austria.
Ultramicroscopy. 2008 Apr;108(5):439-44. doi: 10.1016/j.ultramic.2007.07.003. Epub 2007 Jul 10.
Retardation effects such as Cerenkov losses and waveguide modes alter the valence electron energy-loss spectrum of semiconductors and insulators as soon as the speed of the probing electron exceeds the speed of light inside the probed medium. This leads to the dilemma, that optical properties from these media cannot be determined correctly using electron energy-loss spectrometry (EELS) if no corrections are applied. In this work we present two ways out of this dilemma: a reduction of the beam energy and the application of an off-line correction. We demonstrate the accuracy of these two methods by using two similar layers of Si(x):H having slightly different refractive indices and discuss the impact of the normalization parameter during Kramers-Kronig analysis (KKA) on the obtained dielectric properties. We further demonstrate that KKA can be applied without the use of standard specimens, if thickness determination using transmission electron microscopy and EELS is accurate enough.
一旦探测电子的速度超过被探测介质内部的光速,诸如切伦科夫损耗和波导模式等延迟效应就会改变半导体和绝缘体的价电子能量损失谱。这就导致了一个两难境地:如果不进行校正,就无法使用电子能量损失谱(EELS)正确确定这些介质的光学性质。在这项工作中,我们提出了摆脱这一两难境地的两种方法:降低束流能量和应用离线校正。我们通过使用两个折射率略有不同的相似Si(x):H层来证明这两种方法的准确性,并讨论了克莱默斯-克勒尼希分析(KKA)过程中归一化参数对所得介电性质的影响。我们进一步证明,如果使用透射电子显微镜和EELS进行厚度测定足够准确,那么KKA可以在不使用标准样品的情况下应用。