Kawasaki Naohiko, Sugiyama Naoyuki, Otsuka Yuji, Hashimoto Hideki, Tsujimoto Masahiko, Kurata Hiroki, Isoda Seiji
Morphological Research Laboratory, Toray Research Center Inc, Otsu, Shiga, Japan.
Ultramicroscopy. 2008 Apr;108(5):399-406. doi: 10.1016/j.ultramic.2007.05.012. Epub 2007 Jun 7.
The electronic structures of nanometre-sized nickel silicide systems, Ni(2)Si and NiSi, have been studied by energy-loss near-edge structure (ELNES) and first-principles band structure calculations. Experimental ELNES of Ni L(3)- and Si L(2,3)-edges could be explained well using theoretical spectra calculated for the ground state without the core hole, suggesting metallic properties for both silicides. It was shown that a slight difference in ELNES spectra of Ni(2)Si and NiSi comes from the coupling among the Ni d and Si p, d states in the unoccupied bands. The density of states and the contour plots of all the valence electron densities for Ni(2)Si, NiSi together with NiSi(2) show that Ni(2)Si has the bond with the strongest covalent character between Ni and Si atoms and the most transition metal-like character of the Ni 3d band among the three silicides.
通过能量损失近边结构(ELNES)和第一性原理能带结构计算,对纳米尺寸的硅化镍体系Ni(2)Si和NiSi的电子结构进行了研究。利用无芯空穴基态计算的理论光谱,可以很好地解释Ni L(3)边和Si L(2,3)边的实验ELNES,这表明两种硅化物都具有金属特性。结果表明,Ni(2)Si和NiSi的ELNES光谱存在细微差异,这源于未占据能带中Ni d态和Si p、d态之间的耦合。Ni(2)Si、NiSi以及NiSi(2)的态密度和所有价电子密度的等值线图表明,在这三种硅化物中,Ni(2)Si在Ni和Si原子之间具有最强的共价键特性,且Ni 3d带具有最类似过渡金属的特性。