Shin Heedeuk, Chang Hye Jeong, Boyd Robert W, Choi M R, Jo W
The Institute of Optics, University of Rochester, Rochester, NY 14627, USA.
Opt Lett. 2007 Aug 15;32(16):2453-5. doi: 10.1364/ol.32.002453.
We measure the nonlinear susceptibility of Bi(3.25)La(0.75)Ti(3)O(12) (BLT) thin films grown on quartz substrates using the Z-scan technique with picosecond laser pulses at a wavelength of 532 nm. The third-order nonlinear refractive index coefficient gamma and absorption coefficient beta of the BLT thin film are 3.1 x 10(-10) cm(2)/W and 3 x 10(-5) cm/W, respectively, which are much larger than those of most ferroelectric films. The results show that the BLT thin films on quartz substrates are good candidate materials for applications in nonlinear optical devices.
我们使用Z扫描技术,在波长为532 nm的皮秒激光脉冲下,测量了生长在石英衬底上的Bi(3.25)La(0.75)Ti(3)O(12)(BLT)薄膜的非线性极化率。BLT薄膜的三阶非线性折射率系数γ和吸收系数β分别为3.1×10⁻¹⁰ cm²/W和3×10⁻⁵ cm/W,这比大多数铁电薄膜的相应值大得多。结果表明,石英衬底上的BLT薄膜是用于非线性光学器件的良好候选材料。